Third CORNERSTONE fabrication call

As part of the EPSRC-funded CORNERSTONE project, research institutions are invited to submit mask designs to the third CORNERSTONE Multi-Project Wafer (MPW) run.

This service is offered free of charge to UK institutions, but non-UK submissions are also welcomed for a small charge: please contact This email address is being protected from spambots. You need JavaScript enabled to view it. for pricing details.

The platform for this call is 500 nm Silicon-on-Insulator (SOI) with two Si etch depths of 160 nm and 500 nm.

The deadline for mask submission is Friday 28 July 2017. For more information and full design rules, please refer to the following pdf document CORNERSTONE 3rd Call - Design Rules or visit our website, www.cornerstone.sotonfab.co.uk.

For any queries, please contact This email address is being protected from spambots. You need JavaScript enabled to view it.

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